FDTD is the gold-standard for modeling nanophotonic devices, processes, and materials. This finely-tuned implementation of the FDTD method delivers reliable, powerful, and scalable solver performance over a broad spectrum of applications. The integrated design environment provides scripting capability, advanced post-processing, and optimization routines – allowing you to focus on your design and leave the rest to us.

Key Applications

• CMOS Image sensors • Integrated Photonic Components
• OLEDs • Metamaterials
• Liquid Crystals • Diffractive Optics
• Surface Metrology • Photonic Crystals
• Surface Plasmonics • Defect Detection
• Lithography • Solar Cells

Except for below applications, you can find more examples onApplication Gallery

Key Features

3D CAD Environment

3D CAD Environment and parameterizable simulation objects allow for rapid model iterations.

  • Build 1D, 2D or 3D models
  • Parameterizable simulation objects
  • Import from STL, GDSII

Nonlinearity and Anisotropy

Simulate devices fabricated with nonlinear materials or materials with spatially varying anisotropy.

  • Choose from a wide range of nonlinear, negative index, and gain models
  • Define new material models with flexible material plug-ins

Broadband Fixed-Angle Source Technique (BFAST)

  • Inject light at a fixed angle over broad spectrum for periodic structures
  • BFAST is best suited to non-dispersive dielectric materials and materials with high loss, such as Metal.

Multi-coefficient Models

Uses multi-coefficient models for accurate material modeling over broadband ranges.

  • Accurately represent real materials over broad wavelength ranges
  • Automatically generate models from sample data, or define the functions yourself.

Powerful Post-Processing

  • Powerful built-in scripting environment
  • Powerful post-processing capability, including far-field projection, band structure analysis, bidirectional scattering distribution function (BSDF) generation, Q-factor analysis, and charge generation rate.




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